LiquiPro SL Chemical Mechanical Polishing (CMP) Filters
LiquiPro SL Chemical Mechanical Polishing (CMP) Filters
LiquiPro™ SL Series filters are the next generation of pre-cleaned slurry filters designed for advanced chemical mechanical polishing (CMP).
This filter series is built around the patented DUO3 process of using an outer melt blown media in combination with an inner nanofiber media. This is a departure from the tradition CMP filters that have either all wrapped layers, all pleated layers, or all melt blown layers. These SL Series filters are cost competitive with higher performance over traditional CMP filters.
LiquiPro™ SL
- These filters remove particles, aggregates, agglomerates, and microgels that are disruptive to the CMP process. These filters provide excellent capacity and have a sharp filtration cut off curve, so the particle size distribution of the desired slurry particles does not change after filtration.
- The nano-fiber media used in these filters are reliable and have excellent performance with colloidal, ceria, and alumina slurries.
SLB, SLC, and SLE Sub-series
- Uses a combination of a continuous melt blown media as the outer layers, and nanofiber wrapped media as the inner layers. These filters contain one inlet and one outlet connection.
- SLB: Optimized for less than 3m.
- SLC: Optimized for greater than 3m.
- SLE: Optimized with a larger filtration surface area for greater performance over the SLB filters.
- A vent and drain connection are added to the filter.
SLA, and SLD Subseries
- Uses a combination of pleated 3D melt blown media as the outer layers, and nanofiber wrapped media as the inner layers. These filters are optimized for less than 3m.
- SLA: Contains an inlet and outlet connection
- SLD: Contains an inlet and outlet connection, as well as a vent and drain connection.
LiquiPro™ SL Chemical Mechanical Polishing (CMP) Filters Specifications:
- Pore sizes rating for DUO3 Series: (m)
0.05, 0.07, 0.1, 0.2, 0.3, 0.5, 0.7, 1.0, 1.5, 3, 5, 7, 9, 10, 11. - Maximum differential pressure:
- 2.4 bard (35 psid) @ 21°C (70°F)
- 4.0 bard (58 psid) @ 80°C (176°F)
- Maximum operating temperature
- 80°C (176°F)
- Materials of construction:
- Materials: Polypropylene construction
- Filter Media: PP
- Filter Core/Cage/Endcap: PP
- Cartridge O-rings/gasket: EPDM, FKM, E-FKM, PE gasket
Download Porvair LiquiPro SL Chemical Mechanical Polishing (CMP) Filters Datasheet
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Short description
Next generation of pre-cleaned slurry filters designed for advanced chemical mechanical polishing.